26714
Accession Number
25549
Editor
Vandiver, Pamela B.; Druzik, James; Wheeler, George Segan
Title Of Article Chaper
Ion Beam Analysis of Pigments
Title Of Journal Book
Materials Issues in Art and Archaeology II: Symposium held April 17-21, 1990, San Francisco, California, U.S.A
Volume
185
Pages
125-132
Collation
8 p. : ill.
Reference Bibliography
Includes bibliographical references
Publisher
Materials Research Society
Publisher City
Pittsburgh (Pennsylvania)
ISBN
1-55899-074-7
Language Of Text
English
Language Of Summary
English
Literature Type
Monograph
Literature Level
Analytic
Meeting
Material Research Society Symposium
Meeting City
San Francisco
Meeting Country
United States
Abstract
We have analyzed single and multiple layer paint samples to evaluate 3 MeV external beam proton induced X-ray emission (PIXE) for elemental analysis of inorganic pigments. The results are compared to those from energy dispersive electron microprobe analysis and Rutherford Backscattering Spectrometry (RBS). The advantage of PIXE is that the protons' penetration depth of 100 microns is more the 25 times greater than that of 20 keV electrons and 10 times greater than 3 MeV alpha particles, thus allowing analysis of relatively thick samples of up to 100 microns. The proton beam is passed into the atmosphere (external to the vacuum system) through a thin polymer film, and the beam area on target is 1 mm<sup>2</sup>. Electron microprobe and RBS require vacuum compatible samples; therefore, the pigments were painted on silicon wafers. Calibration was obtained from metallic thin-film samples of known thickness. The cross calibration of the three analytical techniques allowed evaluation of external PIXE analysis of paint films. We suggest that this nondestructive method is suitable for elemental analysis of drawings and paintings provided that further studies indicate no long term damage is caused.
Keywords
ion beam;pigment;paint;PIXE -- CAL
pub_id
26714
Meeting Date
19900417-19900421