13263
Accession Number
899
Author
McKenzie, W.M.
Author Affiliation
University of California. Forest Products Laboratory
Title Of Article Chaper
Applying Grid Patterns to Wood Surfaces Using Photosensitive Laquers
Title Of Journal Book
Forest products journal
Volume
19
Issue
2
Pages
43-44
Reference Bibliography
Bibliog.: p. 44
Language Of Text
English
Literature Type
Serial
Literature Level
Analytic
Abstract
This article describes the use of a photoresist lacquer (Kodak Photoresist, KPR) and a photographic negative with grid patterns as fine as 2,000 lines per inch (from firms specializing in photographic scale reduction for resist etching and electro-plating) on the end grain of dry wood to obtain information on strain associated with the penetration of a cutting edge into wood. References from 1967-68. -- CCI
pub_id
13263